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Displacement measurement analysis in distortion detection of lithography projection objective
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摘要:
在光刻投影物镜的畸变检测中，位移测量误差是光刻投影物镜畸变检测的重要误差源之一，深度分析误差源并减小误差项，可提高光刻投影物镜的畸变检测精度。本文将运动台的定位与测量技术相结合，着重分析利用夏克-哈特曼波前传感器对投影物镜进行畸变检测时像质检测台的位移测量误差。并以一套投影物镜像质检测台为例，对其在投影物镜畸变检测中的位移测量误差进行分析，利用该像质检测台对某一投影物镜进行畸变检测，畸变检测结果约80 nm，其中该像质检测台的位移测量误差会给畸变检测结果带来约22 nm的不确定度。
Abstract:In the distortion detection of the lithography projection objective, the displacement measurement error is one of the important error sources. Depth analysis of the error sources and reduction of the error terms can improve the distortion detection accuracy. Combining the positioning and measurement technology of the moving stage, this paper analyzes the displacement measurement error of the image quality detection stage when the Shack-Hartmann wavefront sensor is used to detect the distortion of the projection objective. In this paper, a set of image quality detection platform is taken as an example to analyze the displacement measurement error in the distortion detection of the projection objective, and the image quality detection platform is used to measure the distortion of a projection objective. The distortion detection result is about 80 nm, in which the displacement measurement error of the image quality detection platform will bring about an uncertainty of about 22 nm to the distortion detection result.
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图 1 投影物镜畸变检测原理图
Figure 1. Schematic diagram of the projection objective distortion measurement
图 2 投影物镜像质检测台结构示意图
Figure 2. Structural schematic diagram of the projection objective image quality detection platform
图 5 投影物镜像质检测台内部结构实物图
Figure 5. Internal structural object picture of the projection objective image quality detection platform
图 7 双频激光干涉仪布局图
Figure 7. Arrangement diagram of the dual-frequency laser interferometer
图 10 微环控系统恒温腔体及控制柜
Figure 10. Constant temperature chamber and control cabinet of the micro-environment control system
图 12 畸变测量时水平阿贝误差示意图
Figure 12. Schematic diagram of the horizontal abbe error in distortion measurement
表 1 双频激光干涉仪仪器误差汇总
Table 1. Instrument errors summary of the dual-frequency laser interferometer
仪器误差 3σ/nm 相关参数 参数值 波长稳定性误差 0.25 被测行程+死程/mm 40+80 电细分误差 0.31 分辨率/nm 0.31 光学非线性误差 1.5 固定值/nm 1.5 数据采集误差 0.01 被测速度/(m/s) 0.01 光束平行度误差 0.04 被测行程/mm 40 合计 1.55 
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表 2 双频激光干涉仪几何误差汇总
Table 2. Geometrical errors summary of the dual-frequency laser interferometer
几何误差 使用六自由度解算模型3σ/nm 未使用六自由度解算模型3σ/nm 相关参数 参数值 阿贝误差 0.25 1.2 阿贝臂/mm 6 最大俯仰角/μrad 0.2 余弦误差 0.31 5.5 测量行程/mm 40 光轴与运动方向夹角/mrad 0.5 反射镜面形误差 1 30 测量范围/mm 40×40 面形加工误差/nm 30 合计 1.08 30.52
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表 3 微环控系统参数
Table 3. System parameters of the micro-environment control system
类别 参数 运行环境温度/(℃) 22±2 运行环境温度变化梯度/(℃/min) ≤0.5 温度设定范围/(℃) 21~−23 全局气浴温度稳定性 ±0.1 ℃@8 h 局部气浴温度稳定性 ±0.01 ℃@4 h
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表 4 双频激光干涉仪环境误差汇总
Table 4. Environmental errors summary of the dual-frequency laser interferometer
环境误差 3σ/nm 相关参数/mm 参数值 被测行程长度误差 1.63 被测行程 40 干涉仪热漂移 0.4 - - 材料热膨胀 0.8 干涉仪离反射镜最大距离 128 死程误差 4.5 死程长度 80 机械振动 1 - - 合计 4.97
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表 5 像质检测台位置测量复现性
Table 5. Positon measurement reproducibility of the image quality detection platform
点序号 X轴复现性/nm Y轴复现性/nm 点序号 X轴复现性/nm Y轴复现性/nm 1 12.29 2.63 14 2.74 7.06 2 12.69 0.93 15 2.76 8.30 3 14.26 0.17 16 3.73 9.56 4 17.42 0.59 17 7.73 7.09 5 13.70 0.40 18 6.55 10.43 6 8.81 1.82 19 3.36 8.46 7 6.12 3.79 20 2.93 7.35 8 8.86 2.79 21 3.70 10.74 9 9.65 0.87 22 1.40 9.4 10 7.97 0.77 23 0.56 8.01 11 1.57 4.23 24 0.11 6.57 12 2.17 9.51 25 0.74 11.96 13 0.46 6.19
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表 6 像质检测台位置测量复现性(关闭微环控系统)
Table 6. Positon measurement reproducibility of the image quality detection platform (micro-environment control system off)
点序号 X轴复现性/nm Y轴复现性/nm 点序号 X轴复现性/nm Y轴复现性/nm 1 90.38 62.10 14 204.77 185.13 2 130.90 50.33 15 228.85 74.61 3 104.52 145.49 16 236.94 103.03 4 128.89 27.5 17 270.60 159.11 5 141.70 92.99 18 243.22 177.69 6 170.90 153.34 19 252.73 171.02 7 154.09 156.13 20 235.13 174.26 8 190.73 152.25 21 218.89 173.47 9 181.26 160.74 22 207.70 170.62 10 189.27 165.97 23 210.58 147.87 11 210.64 187.02 24 219.43 169.11 12 218.64 185.13 25 235.15 186.93 13 186.24 167.52
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