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摘要
深紫外、极紫外光刻、先进光源等现代光学工程牵引驱动超精密光学技术持续发展，超精密光学制造要求与之精度相匹配的超高精度检测技术。作为核心技术指标之一的面形精度通常要求达到纳米、深亚纳米甚至几十皮米量级，超高精度面形干涉检测技术挑战技术极限，具有重要研究意义和应用价值。本文分析了面形干涉检测技术发展趋势，主要介绍了中国科学院光电技术研究所近年来在超高精度面形干涉检测技术相关研究进展。
Abstract
With the continuous development of modern optics, such as EUV, DUV lithography and the advanced light source, the surface interferometric measurement with higher accuracy has become an important challenge. The surface accuracy as one of key technical parameters will be required to nanometer, sub-nanometer, even picometer. The surface interferometric measurement with higher accuracy push the limits of surface metrology, has important research significance and application value. This paper analyzes the development trends of surface interferometric measurement with higher accuracy and reports the related research progress of Institute of Optics and Electronics, Chinese Academy of Sciences.
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Overview
Overview: The demand of modern optical engineering, such as EUV, DUV lithography and the advanced light source, drives the continuous development of advanced optical manufacturing technology. Ultra precision optics, as an important branch of advanced optical manufacturing technology, is the international frontier technology direction developed in the 21st century. Measurement is one of the important means for human beings to understand and transform the material world. Ultra precision optics should be matched by the surface interferometric measurement with higher accuracy, the surface accuracy as one of key technical indexes should be less than nanometer even picometer. The surface interferometric measurement with higher accuracy push the limits of surface metrology. This paper analyzes the surface interferometric measurement with higher accuracy development trends and introduces related research progress of Institute of Optics and Electronics, Chinese Academy of Sciences. The final measurement accuracy is determined by the error factors of the surface interference detection system: The repeatability is affected by the noise in the photoelectric system of the interferometer, the error of the phase extraction algorithm and the environmental error in the optical cavity. Based on the error evaluation model, it can realize the quantitative error evaluation of each subsystem of the interferometer, and the repeatability can reach 0.05 nm RMS. For the recurrence accuracy, the mechanical stability, thermal stability and force stability of system are the major factors. By improving the mechanical and thermal stability and optimizing the design of precision support tooling, the accuracy of measurement can reach 0.1 nm RMS; the accuracy of interference is mainly limited by the accuracy of reference surface. Absolute detection technology can separate the error of reference plane through data processing of relative measurement for many times, which can realize the measurement of higher optical elements by lower reference. It is optimized for different absolute measurement techniques, we have achieved a plane measurement accuracy of 0.23 nm RMS, a sphere measurement accuracy of 0.15 nm RMS, and the accuracy of a high-order aspheric surface with a low-frequency profile deviation is 0.26 nm RMS. The key technology of ultra-high precision profile interference detection is systematically studied and innovated. Based on the international general method, the detection accuracy is cross verified, and the detection technology effectively supports the ultra-precision optical manufacturing. It lays an important technical foundation for the research and development of ultra-high performance optical system.
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图 7 相对检测和绝对检测对比。
Figure 7. The comparison of surface with absolute measurement and relative measurement.
图 9 平面标定实验结果对比。
Figure 9. The comparison results with different plane calibration methods.
图 13 多特征匹配的数据处理优化算法结果对比。
Figure 13. The compared maps between ZYGO and multi-feature matching optimization algorithm.
图 16 基于平移旋转的球面绝对检测示意图
Figure 16. The scheme of absolute test of spherical surface based on shift-rotation method
图 19 基于有限元模型(FEM)的重力变形补偿流程
Figure 19. The flow chart of gravity flow deformation compensation based FEM
图 22 仿真与实测CGH杂散光面形误差比较。
Figure 22. Comparison of simulated and measured figure error induced by stay light in the first CGH system.
图 24 拟蒙特卡洛方法实现概率密度函数(PDF)传递的不确定度评估流程
Figure 24. The flow chart of uncertainty evaluation basic Quasi-MCM
表 2 球面绝对检测方法对比
Table 2. The comparison of absolute spherical testing methods
名称 标定对象 存在挑战 特点 双球面法 被测面
参考面1)猫眼位置对误差不敏感
2)无法标定发散标准镜头三位置，五位置 随机球法 参考面 1)自动控制平台
2)不适合大F数标准镜头原理简单，易操作 平移旋转法 被测面
参考面1)大范围的六维调整平台
2)数据处理算法较为复杂稳定性高，通用性好 
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参考文献
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