Measurement of polarization correlation coefficients of light source and spectrometer in spectroscopic ellipsometry
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摘要:
光谱椭偏测量技术已广泛应用于材料科学、微电子、物理化学和生物医学等领域。在光谱椭偏测量系统中,由于起偏器和检偏器存在漏光等瑕疵,光源子系统的偏振度和光谱仪子系统的偏振敏感度会影响光谱椭偏系统的测量精度。针对这一问题,本文建立了光谱椭偏测量系统的偏振相关系数的修正模型;并提出了一种同时测量光源子系统和光谱仪子系统偏振相关系数的方法。利用现有实验室内的宽带光源系统和宽带光谱仪验证了这种测量方法的可行性。
Abstract:Spectroscopic ellipsometry has been widely used in materials science, microelectronics, physical chemistry and biomedicine. In the spectroscopic ellipsometry system, the degree of polarization of the light source subsystem and the polarization sensitivity of the spectrometer subsystem will affect the measurement accuracy of the spectroscopic ellipsometry considering the leakage of polarizer and analyzer. To remove this systematic error, we included the degree of polarization of light from source and the polarization sensitivity of the spectroscopic ellipsometry in our calibration model; a method for measuring the polarization state of light source subsystem and polarization sensitivity of a spectrometer subsystem is proposed. To verify the method, we present the measurement setup and results for a commercial broadband light source and broadband spectrometer.
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Overview: Spectroscopic ellipsometry has been widely used in materials science, microelectronics, physical chemistry and biomedicine due to the advantages of non-destructive, non-interference, fast speed and high accuracy. Many researchers have improved system models to correct the effect by artifacts of spectroscopic ellipsometry system, including those artifacts of polarizer due to its optical activity, leakage and stress birefringence, artifact of wave plate compensator, the correction to finite numerical aperture and the finite spectral bandwidth, as well as those artifacts by focusing lens due to the optical activity and stress birefringence. Additionally, we considered in this paper the influence of polarization degree of the light source and polarization sensitivity of spectrometer, and find that these artifacts need to be corrected for ultra-high accuracy measurement. Furthermore, we presented here a method to measure the polarization correlation coefficients simultaneously for light source and spectrometer. Theoretically, the polarization correlation coefficients of the light source can be measured by a spectrometer with known polarization characteristics, and the polarization correlation coefficients of the spectrometer can be measured by a light source with known polarization state. However, these measurement methods rely on additional characterized light sources and spectrometers, which can be troublesome often.
In this article, we analyzed the effect of polarization parameters of light source and spectrometer on spectroscopic ellipsometry via a correction model; and proposed a method for measuring the polarization correlation coefficients of light source subsystem and spectrometer subsystem simultaneously and mutually. This is done by adding polarizers or combination of polarizers and wave plates between light source and spectrometer subsystem. For illustration of the measurement method, we demonstrated the feasibility by measuring the polarization correlation coefficients of the light source and spectrometer in our laboratory. The measurement results show that the degree of polarization of our light source has a relatively large variation over 400 nm~800 nm range, and a sharp spike in 425 nm~460 nm is found. Since this band coincident with the combination band of a deuterium lamp and a halogen lamp, this may indicate a large polarization dependent reflectivity of the beam combiner. The polarization correlation coefficient of the spectrometer is below 0.05, which shows that the spectrometer may take polarization insensitive design to reduce the polarization dependence of reflective gratings.
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图 2 光源子系统和光谱仪子系统偏振相关系数测量装置示意图。其中P, A为偏振器,C为波片。(a) (A1,A2,P1,P2)测量装置图;(b) P3测量装置图;(c) A3测量装置图
Figure 2. Schematic diagram of polarization correlation coefficients measurement setup for light source subsystem and spectrometer subsystem, where P, A are polarizers and C is a wave plate. (a) Schematic diagram of (A1, A2, P1, P2) measurement setup; (b) Schematic diagram of P3 measurement setup; (c) Schematic diagram of A3 measurement setup
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