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车削掩模的石英非球面微透镜阵列制作方法

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文章导航 > 光电工程 > 2018 Vol. 45 > No. 4 > 170671

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王灏, 董连和, 朱国栋, 等. 车削掩模的石英非球面微透镜阵列制作方法[J]. 光电工程, 2018, 45(4): 170671. doi: 10.12086/oee.2018.170671
引用本文: 王灏, 董连和, 朱国栋, 等. 车削掩模的石英非球面微透镜阵列制作方法[J]. 光电工程, 2018, 45(4): 170671. doi: 10.12086/oee.2018.170671
shu
Wang Hao, Dong Lianhe, Zhu Guodong, et al. Fabrication method of quartz aspheric microlens array for turning mask[J]. Opto-Electronic Engineering, 2018, 45(4): 170671. doi: 10.12086/oee.2018.170671
Citation: Wang Hao, Dong Lianhe, Zhu Guodong, et al. Fabrication method of quartz aspheric microlens array for turning mask[J]. Opto-Electronic Engineering, 2018, 45(4): 170671. doi: 10.12086/oee.2018.170671
shu

车削掩模的石英非球面微透镜阵列制作方法

    • 1.

      长春理工大学光电工程学院，吉林 长春 130022

    • 2.

      中国科学院重庆绿色智能技术研究院微纳制造与系统集成研究中心，重庆 400714

详细信息
    作者简介:
  • 王灏(1992-)，男，硕士研究生，主要从事光学微纳加工方面的研究。E-mail: 416539621@qq.com
    • *通讯作者: 董连和(1953-)，男，教授，博士生导师，主要研究光学微纳制造、微纳光学元器件以及目标特征信号控制技术。E-mail：custdong@126.com;  张为国(1983-)，男，硕士，高级工程师，主要研究领域包括微纳光学，先进制造等。E-mail：zwg@cigit.ac.cn

  • 中图分类号: O439

Fabrication method of quartz aspheric microlens array for turning mask

    • 1.

      School of Opto-Engineering, Changchun University of Science and Technology, Changchun, Jilin 130022, China

    • 2.

      Micro-Nano Manufacturing and System Integration Center, Chongqing Institute of Green and Intelligent Technology, Chinese Academy of Sciences, Chongqing 400714, China

More Information
    摘要

  • 为解决石英非球面微透镜阵列加工所面临的工艺可控性差且面型精度不高这两大难点，提出了一种基于车削掩模刻蚀的石英玻璃元件制作方法。该方法主要使用了单点金刚石车削加工技术与反应离子刻蚀技术，研究了掩模材料车削及刻蚀性能，并利用实验优选出掩模材料，最后进行了面积为5 mm×5 mm石英玻璃非球面微透镜阵列的制备。通过实验结果与预期参数进行对比，分析表明，该方法制作的石英玻璃元件误差均方根为1.155 nm，面型精度误差0.47%。

    In order to solve the two difficult problems of the poor processing controllability and the low surface accuracy of quartz aspheric microlens array processing, a fabrication method of quartz aspheric microlens array for turning mask is proposed. This method mainly uses single point diamond turning technology and reactive ion etching technology, studies the turning and etching properties of the mask material, and optimizes the mask material by experiment. Finally, the fabrication of an aspherical glass microlens array with an area of 5 mm×5 mm was carried out. The experimental results are compared with the expected parameters. The analysis shows that the error root mean square of the quartz glass component is 1.155 nm, and the surface accuracy error is 0.47%.

    • Overview

  • Overview: In the existing mature processing methods, the processing of micro optical structure can be divided into two major categories: microstructural lithography and single point diamond turning. Microstructural lithography can be used to process inorganic materials, such as quartz, silicon and so on. However, microstructural lithography has not been able to solve the problem of micro and nano structure shape control. The single point diamond turning technology can achieve precise control of the surface shape, but it is difficult to process the inorganic and brittle materials.

    In order to solve the two difficult problems of quartz aspheric microlens array processing, such as poor controllability and low surface accuracy, a method of making quartz glass based on turning mask and etching is proposed. The single point diamond turning technology and micro photomask technology is innovatively combined. The mask layer pattern is made by single point diamond turning, and then the mask pattern is transferred by reactive ion etching. Finally the fabrication of quartz glass aspheric microlens array element is completed.

    We mainly make the selection of the mask material and study the etching performance and turning performance of PMMA and AZ50XT photoresist. We find that the addition of AZ50XT photoresist in PMMA can effectively improve the anti etching performance, not only meet the requirements of single point diamond turning, and after reactive ion etching after the mask pattern can be maintained by the original still. By analyzing the surface roughness of mask after single point diamond turning and the surface roughness of mask after reactive ion etching, we get the most suitable mask material for this processing method. Finally, the new material is used to make the mask. The pattern is made on the mask surface by single point diamond turning, and the mask pattern is transferred to the quartz substrate by reactive ion etching technology. The aspheric microlens array with area of 5 mm×5 mm is obtained.

    The experimental results are compared with the expected parameters. The analysis shows that the root mean square error of the quartz glass element manufactured by this method is 1.155 nm and the accuracy of face shape error is 0.47%. The experimental results show that this method possesses not only the advantages of single point diamond turning technology, such as high surface accuracy, high processing stability and mature technology, but good anisotropy of reactive ion etching technology. This method has great potential for development, and it also provides a strong support for the wider application of quartz glass materials.

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  • 图 1  基于车削掩模的非球面微透镜阵列制作方法原理图

    Figure 1.  Fabrication method of aspheric microlens array based on turning mask

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    图 2  不同参数掩模材料刻蚀后的表面粗糙度曲线

    Figure 2.  Surface roughness curves of masking materials with different parameters after etching

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    图 3  不同参数掩模材料车削后的表面粗糙度曲线

    Figure 3.  Surface roughness curves of masking materials with different parameters after turning

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    图 4  非球面微透镜阵列掩模检测结果图

    Figure 4.  Test results of aspheric microlens array

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    图 5  石英玻璃元件检测结果图

    Figure 5.  Test results of quartz glass elements

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    图 6  预期微镜截面与加工后微镜截面对比图

    Figure 6.  Comparison of the expected cross section of micromirror and the cross section of the micromirror after processing

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收稿日期:  2017-12-09
修回日期:  2018-01-05
刊出日期:  2018-04-01

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